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Concept information

Preferowany termin

3920 10 23Polyethylene film, of a thickness of 20 micrometres or more but not exceeding 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits  

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Terminy pojęciowe

  • Polyethylene film, of a thickness of 20 micrometres or more but not exceeding 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Notka dotycząca zakresu

  • Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

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Identyfikator

  • 392010230080

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URI

http://data.europa.eu/xsp/cn2024/392010230080

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